Parkwalk are delighted to have closed an investment in Reduse, an...
 
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Parkwalk University of Cambridge Enterprise Fund III investment in Reduse
 
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Reduse

We are pleased to announce that the University of Cambridge Enterprise Fund III has closed an investment into Reduse, a spin out from the Low Carbon Materials Processing Group at the University of Cambridge.

 
 

Dear , 

Reduse are seeking to change the way laser printed office paper is treated post use. Instead of disposal, recycling and shredding a substantial percentage of laser printed sheets can, using the ‘unprinter’ technology, be cleaned of all toner without damaging the paper.  

Carrying out the processes of delivery, storage and control of waste paper takes time; and the costs of secure shredding and footprint are significant.

The Market

The average office employee uses 10,000 sheets of paper every year, most of which are discarded within just a few days. Unprinting is easy to implement, and delivers stunning cost savings and CO2 reductions. 

The ultimate statement of potential market could be to have an ‘unprinter’ for every laser printer. The potential market is huge if this use-case can be developed during the seed finance phase. The Legal profession would be a fairly obvious target customer as would the Security Industry. The technology could be used to redact sensitive documents.

The company has a strong early stage management team.

The Team

Hidde-Jan Lemstra, CEO & co-founder, has entrepreneurial experience in the Netherlands, UK, US and Africa. He has corporate experience at Shell, Prudential and ABN Amro in strategy, M&A, and HR. BSc in International Business from Maastricht University. 

Stuart Evans, Non-Exec Chairman and co-founder, is a technology entrepreneur since 1984, and founding CEO at Plastic Logic, Novacem and Cotag International. Stuart spent his early career at IBM and McKinsey; he holds an MBA from Harvard Business School and has twice been named a Technology Pioneer by the World Economic Forum in Davos. 

David Leal, Chief Scientist and co-founder, is a Cambridge PhD in Engineering under the supervision of Prof Julian Allwood of the Low Carbon Materials Processing Group where the concept of unprinting was first developed. David holds an MSc from University of Manchester, and a BSc from the Monterrey Institute of Technology in Mexico.

Tony Dunn, Chief Technology Officer, is a Chartered Engineer, with 20+ year’s product development experience. Tony was formerly with TTP and latterly with Irisys. As a former head of R&D, Tony has significant experience with Intellectual Property and design/development for manufacturing. In previous companies he worked extensively on printers and printer related technologies.

 
 
 
 
 
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Parkwalk EIS Funds

Parkwalk VI has closed to new investors, however our evergreen Opportunities EIS Fund remains open all year.
If you would like more information on the Parkwalk UK Tech EIS Funds please reply to this email or call the funds team on 020 7759 2285.

 
 
 
 
 

Important Information

This financial promotion is issued by Parkwalk Advisors Limited (Parkwalk), which is authorised and regulated by the Financial Conduct Authority.  Investments referred to in this newsletter are not suitable for all investors.  Interested parties are strongly recommended to seek specialist financial and tax advice before investing in any product.  Capital is at risk and investors may not get back the full amount invested. Tax treatment depends on the individual circumstances of each investor and may be subject to change. Past performance is not a reliable indicator of future results, and the value of investments may go down as well as up. Projections and forecasts are also not a reliable indicator of future performance. Investments in small and unquoted companies carry a higher risk than many other forms of investment. Any investment in a Parkwalk product must only be made on the basis of the terms of the full Information Memorandum. Parkwalk is not able to provide advice as to the suitability of investing in any product.